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process chamberの例文

例文モバイル版携帯版

  • The CIS anode may be viewed as a high conductance tube connected directly to the process chamber.
  • The input gases enter the remote plasma source and are transported to the main process chamber to react.
  • On the other hand, depositions and etches process entire wafers at once, without the need for wafer stage motion in the process chamber.
  • In 1987, Applied introduced a CVD machine called the Precision 5000, which differed from existing machines by incorporating diverse processes into a single machine that had multiple process chambers.
  • Monitoring the ambient with a thermocouple has only recently become feasible, in that the high temperature ramp rates prevent the wafer from coming to thermal equilibrium with the process chamber.
  • Originally, plasma was generated in the process chamber, but as the need to get rid of free radicals has increased, many machines now use a downstream plasma configuration, where plasma is formed remotely and the desired particles are channeled to the wafer.
  • The "'Core Facility "'consists mainly of a vacuum-tight stainless steel cylinder ( "'Process Chamber "') capable of accommodating different individual "'Furnace Inserts "'( FIs ), within which sample processing is carried out.